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■ 反應式離子蝕刻機 RIE / 電漿輔助化學沉積系統 PECVD

反應式離子蝕刻機 PHANTOM II - Rollaway Reactive Ion Etcher (RIE)
反應式離子蝕刻機

The Phantom II RIE system is the most advanced best-supported and most competitively priced RIE system on the market today. It is designed for etching nitrides, oxides and any films or substrate requiring fluorine based chemistries. It's modular design, mounted on a space-saving rollaway platform, has become the system of choice for many users throughout the world. It has numerous available options, such as: ICP, turbo pump, electrostatic chuck with helium backside cooling, laser endpoint detection, optical spectrometer, load lock with automated robot.
反應式離子蝕刻機

Applications

Processes have been thoroughly developed for either isotropic or anisotropic etching of silicon dioxide, silicon nitride and other materials using fluorine based chemistries. Our demonstration lab is available to process samples and develop etch process for new materials.

反應式離子蝕刻機

Markets

Compound Semiconductors
Opto-Electronics
MEMS
Silicon
Research and Development
Failure Analysis
High Volume Production
HDP,

反應式離子蝕刻機

電漿輔助化學沉積系統
ORION II - Plasma Enhanced Chemical Vapor Deposition (PECVD) Tool
電漿輔助化學沉積系統

The Orion II is the first PECVD system to produce production quality films at an affordable price. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The Orion II meets all safety, facility and process requirements within the laboratory and pilot line production environment. Housed on a space saving rollaway platform, the Orion II's modularly engineered design allows for simple serviceability and maximum uptime. The Orion II can incorporate an optional vacuum load lock plus many standard features not typically found on a system so competitively priced, which is why many users worldwide have made the Orion II their PECVD system of choice.
電漿輔助化學沉積系統

Applications

Processes have been thoroughly developed for the deposition of a wide range of dialectric films and materials. The Orion II is being widely used for deposition of both Silane and TEOS based Oxides, Nitrides, Oxynitrides, Silicon Carbide, Amorphous Silicon and Polysilicon.

   
 
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update: 2017-09-19